張浩晨, 徐鍇, 燕增宇, 宋志朋, 陳廣超

中國(guó)科學(xué)院大學(xué)材料科學(xué)與光電技術(shù)學(xué)院

       Zhang H C, Xu K, Yan Z Y, et al. Dynamic friction polishing of single crystal diamond. Journal of University of Chinese Academy of Sciences, 2024, 41(5): 604-611.

       DOI: 10.7523/j.ucas.2023.003

       摘要：在眾多單晶金剛石拋光方法中，動(dòng)態(tài)摩擦拋光(DFP)因其具有極高的去除速率而受到廣泛關(guān)注。研究DFP過程中3種拋光參數(shù)(拋光載荷、拋光時(shí)間和拋光盤線速率)以及3種夾持方式(粘接式、鑲嵌式和卡鉗式)對(duì)單晶金剛石拋光效果的影響。結(jié)果表明：增大拋光載荷、拋光時(shí)間和拋光盤線速率，都會(huì)導(dǎo)致樣品的質(zhì)量損耗增加和表面粗糙度降低，并提升金剛石(400)面的衍射峰強(qiáng)度。在3種夾持方法中，粘接式夾持的去除速率最快，最高可達(dá)25.2 nm/h，鑲嵌式夾持最慢，卡鉗式夾持介于前二者之間。定義一個(gè)拋光評(píng)價(jià)參量K：K=ΔRa/Δm，即單位材料損耗量下獲得的表面粗糙度改善。根據(jù)K值的變化，可將DFP過程劃分為以“粗糙度改善”為主和以“質(zhì)量損耗”為主的2個(gè)階段，前者K值高于后者。拋光參數(shù)中，增加拋光盤線速率可以單調(diào)提高K值，而拋光載荷和拋光時(shí)間對(duì)K值存在復(fù)雜影響。

       Abstract：The dynamic friction polishing (DFP) method has received extensive attention due to its significantly high removal rate comparing with other single crystal diamond polishing methods. In this study, three parameters (polishing load, polishing time, and polishing plate linear velocity) and three clamping types (bonded, inlay, and caliper type) were studied on the influence on the samples' surface roughness (Ra) improvement and the mass loss. The results showed that the increase of the mass loss and the reduction of roughness occurred with increasing the polishing load, the polishing time, and the polishing plate linear velocity, respectively. Whilst, the X-ray diffraction intensity of (400) crystalline surface of each polished sample was enhanced. Among the three clamping types, the bonded clamping type possessed the fastest removal rates, up to 25.2 nm/h. A polishing evaluation parameter, K, was defined as K=ΔRa/Δm, i.e., representing the improvement in surface roughness obtained per unit mass loss. According to variation of the parameter K, the DFP procedure could be divided into two stages, "the roughness improvement domination stage" and "the mass loss domination stage", with the former having higher K values than the latter. K values increased monotonically with the increase of the polishing plate linear velocity, whilst they were influenced complicatedly by the polishing load and the polishing time.

       關(guān)鍵詞：?jiǎn)尉Ы饎偸? 動(dòng)態(tài)摩擦拋光, 粗糙度, 質(zhì)量損耗, 夾持方式

       Keywords: single crystal diamond, dynamic friction polishing (DFP), roughness, mass loss, clamping type